Is ultrathin coating the next step-up for porous semiconductors ?
Résumé
The use of porous materials offers many advantages in the fields of electronics, biomedical, optics and even more. However, giving advanced functions to these materials to obtain porous composites could lead to find undiscovered properties that could benefit to the general public. A way to synthesize these composites is to develop ultrathin coatings of the porous structures. After a quick review of the available techniques, their advantages and limitations, this seminar will focus on the use atomic layer deposition (ALD) for functional coatings. During the presentation, we will see a brief history of ALD and how this technique became unavoidable in the field of microelectronics? Is it possible that to see the same thing happening in the field of porous semiconductors? The technique, although very simple to implement, allows fine-tuning in terms of thickness, films stoichiometry and even optical properties. It is also the place for brilliant innovative technological improvement for the machines to handle large-area substrates or even to coat powders. We will present interesting coating capabilities for various engineering and research fields. However, many limitations still impedes the development of the technique for industries: the slow deposition rate into porous media. Can we improve it? Can we also develop greener processes? We will discuss the opportunities during the webinar.