Article Dans Une Revue Journal of Applied Physics Année : 2019

Dislocation structure and microstrain evolution during spinodal decomposition of reactive magnetron sputtered heteroepixatial c-(Ti0.37,Al0.63)N/c-TiN films grown on MgO(001) and (111) substrates

Résumé

Heteroepitaxial c-(Ti0.37,Al0.63)N thin films were grown on MgO(001) and MgO(111) substrates using reactive magnetron sputtering. High resolution high-angle annular dark-field scanning transmission electron micrographs show coherency between the film and the substrate. In the as-deposited state, x-ray diffraction reciprocal space maps show a strained epitaxial film. Corresponding geometric phase analysis (GPA) deformation maps show a high stress in the film. At elevated temperature (900 °C), the films decompose to form iso-structural coherent c-AlN-and c-TiN-rich domains, elongated along the elastically soft <100> directions. GPA analysis reveals that the c-TiN domains accommodate more dislocations than the c-AlN domains. This is because of the stronger directionality of the covalent bonds in c-AlN compared with c-TiN, making it more favorable for the dislocations to accumulate in c-TiN. The defect structure and strain generation in c-(Ti,Al)N during spinodal decomposition is affected by the chemical bonding state and elastic properties of the segregated domains.

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hal-04966917 , version 1 (26-02-2025)

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K. Calamba, J. Pierson, S. Bruyère, A. Febvrier, P. Eklund, et al.. Dislocation structure and microstrain evolution during spinodal decomposition of reactive magnetron sputtered heteroepixatial c-(Ti0.37,Al0.63)N/c-TiN films grown on MgO(001) and (111) substrates. Journal of Applied Physics, 2019, 125 (10), pp.105301. ⟨10.1063/1.5051609⟩. ⟨hal-04966917⟩
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