E-beam Fluorinated CVD Graphene: in-situ XPS study on stability and NH3 adsorption doping effect - Archive ouverte HAL
Article Dans Une Revue Nanotechnology Année : 2024

E-beam Fluorinated CVD Graphene: in-situ XPS study on stability and NH3 adsorption doping effect

Résumé

Abstract Graphene exhibits promise in gas detection applications despite its limited selectivity. Functionalization with fluorine atoms offers a potential solution to enhance selectivity, particularly towards ammonia (NH+) molecules. This article presents a study on electron-beam fluorinated graphene (FG) and its integration into gas sensor platforms. We begin by characterizing the thermal stability of fluorographene, demonstrating its resilience up to 450°C. Subsequently, we investigate the nature of NH3 interaction with FG, exploring distinct adsorption energies to address preferential adsorption concerns. Notably, we introduce an innovative approach utilizing XPS cartography for simultaneous analysis of fluorinated and pristine graphene, offering enhanced insights into their properties and interactions. This study contributes to advancing the understanding and application of fluorinated graphene in gas sensing technologies
Fichier principal
Vignette du fichier
Paper_GFluore_source_file_vf.pdf (1.83 Mo) Télécharger le fichier
Origine Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-04822237 , version 1 (06-12-2024)

Identifiants

Citer

Vincent Malesys, Tianbo Duan, Emmanuel Denys, Hu Li, Klaus Leifer, et al.. E-beam Fluorinated CVD Graphene: in-situ XPS study on stability and NH3 adsorption doping effect. Nanotechnology, 2024, ⟨10.1088/1361-6528/ad9ab0⟩. ⟨hal-04822237⟩
0 Consultations
0 Téléchargements

Altmetric

Partager

More