Evolution of the liquid/solid interface roughness in Si$_{1-x}$Ge$_x$ layers processed by nanosecond laser annealing
Résumé
Pulsed laser annealing is a relevant alternative to conventional thermal processes for future technology nodes as it enables the application of a fast and local thermal budget. Such high-energy process can lead to the formation of a liquid phase that recrystallizes upon heat dissipation, through a high velocity liquid/solid interface moving towards the surface. Here, we report on the evolution of the liquid/solid interface roughness and its influence on the crystallinity of Si 1-x Ge x layers depending on multiple parameters (strain state, doping level, Ge content, and pulse duration). This has been conducted with a roughness quantification method based on cross-section STEM-HAADF micrographs. It has been established that the liquid/solid roughness can be decreased by: (i) a compressive strain decrease, (ii) the use of short duration laser pulses or (iii) a reduction of the initial Ge content. The Ge content and strain must correspond to suitable values for optimized MOSFET performances. Consequently, strain and pulse duration were found to be pertinent levers for liquid/solid interface roughness reduction. Increasing the amount of boron atoms in s-Si 1-x Ge x :B/Si systems is another relevant strategy, as compressive strain decrease would then be associated with a beneficial contact resistance lowering in the sourcedrain regions of p-type MOSFET devices.
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