Communication Dans Un Congrès Année : 2021

INTRINSIC MECHANICAL PROPERTIES DETERMINATION OF MODERATE TEMPERATURE PROCESSED CVD AMORPHOUS SILICON OXIDE (SiO2) AND OXYNITRIDE (SiOxNy) THIN FILMS

Hugues Vergnes
Brigitte Caussat
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hal-04766876 , version 1 (05-11-2024)

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  • HAL Id : hal-04766876 , version 1

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Maxime Puyo, Charlotte Lebesgue, Konstantina Christina Topka, Babacar Diallo, Raphaël Laloo, et al.. INTRINSIC MECHANICAL PROPERTIES DETERMINATION OF MODERATE TEMPERATURE PROCESSED CVD AMORPHOUS SILICON OXIDE (SiO2) AND OXYNITRIDE (SiOxNy) THIN FILMS. International Conference on Metallurgical Coatings and Thin Films (ICMCTF), Apr 2021, San Diego, United States. ⟨hal-04766876⟩
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