Thermal characterization of Ge-rich GST thin films for phase change memories by Raman thermometry - Archive ouverte HAL
Article Dans Une Revue Journal of Applied Physics Année : 2024

Thermal characterization of Ge-rich GST thin films for phase change memories by Raman thermometry

Résumé

Doped GeSbTe (GST)-based phase change materials are of growing interest due to their ability to enable high-temperature data retention for embedded memory applications. This functionality is achieved through Ge enrichment and addition of dopants such as N and C in stoichiometries such as GST-225, which improve the crystallization temperature and thermal phase stability. In this study, we examine the effect of these dopants on thermal conductivity using Raman thermometry. We report the temperature-dependent thermal conductivity of the amorphous and crystalline phases of Ge-rich GeSbTe (GGST) and Ge-rich GeSbTe N-doped (GGSTN) thin films. The results reveal a surprising temperature dependence of the thermal conductivity of the crystalline phase of GGST and GGSTN, a phenomenon not typically observed for GST-based materials. Additionally, enrichment of Ge and subsequent N-doping result in reduced thermal conductivity, which can benefit the power consumption of phase change memories. From a characterization perspective, Raman thermometry has been developed as a technique for simultaneous structural and thermal characterization of GST-based materials.

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hal-04764747 , version 1 (04-11-2024)

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Akash Patil, Yannick Le-Friec, Pascal Roussel, Yves Deblock, Simon Jeannot, et al.. Thermal characterization of Ge-rich GST thin films for phase change memories by Raman thermometry. Journal of Applied Physics, 2024, 136, ⟨10.1063/5.0226265⟩. ⟨hal-04764747⟩
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