Exploring chemical pathways and kinetics for designed electroceramics by spark plasma sintering and solvent assisted sintering processes - Archive ouverte HAL
Communication Dans Un Congrès Année : 2023

Exploring chemical pathways and kinetics for designed electroceramics by spark plasma sintering and solvent assisted sintering processes

Sylvie Bordère

Résumé

Sintering is a complex process involving different transport mecha-nisms leading to specific microstructural evolutions and thus the pos-sibility of tuning properties. The development of advanced sintering methods involving combinations of stimuli (Field Assisted Sintering Technologies) and/or the use of solvent (Cold Sintering process (CSP), Hydrothermal Sintering (HS)) has contributed significantly to recent breakthroughs. The search for new chemical pathways ena-bling low temperature densification has opened significant perspec-tives towards the elaboration of ceramics in an energy-efficient way. Different strategies associated to these advanced sintering processes have emerged aiming tailor-made materials with controlled function-alities. In this stimulating context, our strategies for designed electroceram-ics are built on three pillars: chemical reactivity, surface chemistry, and defect chemistry. Through several illustrations focused on Spark Plasma Sintering (SPS), CSP and HS, the guiding thread of chemistry in the choice of precursors and synthesis routes, up to the densification mechanism will be shown according to the sintering process. In SPS sintered ferroelectric and piezoelectric materials, the chemistry at interfaces is controlled by a design at different scales (core@shell particle, multilayer device structure, etc…). Other levers such as off-equilibrium conditions can be exploited to provide effi-cient chemical pathways for densification, as highlighted in our in-vestigations dedicated to zirconia. Finally, our recent experimental and modelling studies on ZnO and SiO2 show the complexity of mechanisms involved in solvent assisted and low temperature sinter-ing by CSP and HS.

Domaines

Matériaux
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Dates et versions

hal-04638608 , version 1 (08-07-2024)

Identifiants

  • HAL Id : hal-04638608 , version 1

Citer

Catherine Elissalde, U-Chan Chung, Etienne Martin, Yoan Denis, Christopher Castro Chavarria, et al.. Exploring chemical pathways and kinetics for designed electroceramics by spark plasma sintering and solvent assisted sintering processes. Sintering 2023 - The International Conference on Sintering, Ceramic Society of Japan; Engineering Ceramics Division, Aug 2023, Gifu, Japan. ⟨hal-04638608⟩
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