Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition - Archive ouverte HAL Access content directly
Journal Articles Advanced Materials Research Year : 2007

Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition

Abstract

Alumina thin films were processed from aluminium tri-iso-propoxide in a horizontal, with N2 as a carrier gas, occasional addition of water in the gas phase, deposition temperature in the range 350-700°C, total pressure 0.67 kPa (2 kPa when water was used). The films do not diffract X-ray when prepared below 700°C. At 700°C, they start to crystallize as γ-alumina. EDS, EPMA, ERDA, RBS, FTIR and TGA revealed that films prepared in the range 350-415°C, without water in the gas phase, have an overall composition Al2O3-x(OH)2x, with x tending to 0 with increasing temperature. Al2O3 is obtained above 415°C. When water is added in the vapour phase, the film composition is Al2O3, even below 415°C. Coatings deposited in these conditions show promising protection properties.
Fichier principal
Vignette du fichier
Sovar_2766.pdf (198.52 Ko) Télécharger le fichier
Origin : Files produced by the author(s)

Dates and versions

hal-04501392 , version 1 (12-03-2024)

Identifiers

Cite

Maria-Magdalena Sovar, Diane Samélor, Alain Gleizes, Pierre Alphonse, S. Perisanu, et al.. Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition. Advanced Materials Research, 2007, 23, pp.245-248. ⟨10.4028/www.scientific.net/AMR.23.245⟩. ⟨hal-04501392⟩
3 View
4 Download

Altmetric

Share

Gmail Facebook X LinkedIn More