Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up during Sputter-Deposition of Nanoscale Silicide Films - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue ACS Applied Materials & Interfaces Année : 2016
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hal-04456055 , version 1 (13-02-2024)

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Bärbel Krause, Grégory Abadias, Anny Michel, Peter Wochner, Shyjumon Ibrahimkutty, et al.. Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up during Sputter-Deposition of Nanoscale Silicide Films. ACS Applied Materials & Interfaces, 2016, 8 (50), pp.34888-34895. ⟨10.1021/acsami.6b12413⟩. ⟨hal-04456055⟩
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