Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures - Archive ouverte HAL
Article Dans Une Revue Surface and Coatings Technology Année : 2019

Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures

Résumé

Thin films of (CoCrCuFeNi)Ox were deposited by direct current magnetron sputtering in a mixed O2/Ar atmosphere. Stoichiometric films with a rock-salt (B1) crystal structure and a zone T microstructure were obtained at high oxygen pressures. HR-TEM and STEM studies demonstrated a homogeneous elemental distribution, the constituting metals are in a solid solution on the cation sites. This material system shows several similarities with sputtering the same alloy in a mixed N2/Ar atmosphere: a textural change from a 100 to a 100 out-of-plane alignment occurs with the introduction of the reactive gas species and at high reactive gas flows, both systems achieve a B1 structure. The most profound difference is the higher incorporation rate of oxygen compared to nitrogen, which can be attributed to a larger electronegativity of the former element.
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hal-04453983 , version 1 (12-02-2024)

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Robin Dedoncker, Gyorgy Radnóczi, Grégory Abadias, Diederik Depla. Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures. Surface and Coatings Technology, 2019, 378, pp.124362. ⟨10.1016/j.surfcoat.2019.02.045⟩. ⟨hal-04453983⟩
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