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Poster De Conférence Année : 2018

GD-OES crater engineering: the challenge of wet chemical and/or Ar cluster sputtering curing for nanometric XPS analyses

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hal-04427623 , version 1 (30-01-2024)

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  • HAL Id : hal-04427623 , version 1

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Anaïs Loubat, Sofia Gaiaschi, Fabien Mollica, Mathieu Frégnaux, Damien Aureau, et al.. GD-OES crater engineering: the challenge of wet chemical and/or Ar cluster sputtering curing for nanometric XPS analyses. Surface Fest, Jun 2018, Bordeaux, France. ⟨hal-04427623⟩
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