Tunnel Oxide Modification During PECVD Poly-Si Deposition for Passivating Contacts
Anatole Desthieux
(1, 2, 3)
,
Jorge Posada
(1, 3)
,
Pierre-Philippe Grand
(1, 3)
,
Cédric Broussillou
(4)
,
Barbara Bazer-Bachi
(4)
,
Gilles Goaer
(4)
,
Davina Messou
(5, 1)
,
Muriel Bouttemy
(5)
,
Etienne Drahi
(6)
,
Pere Roca I Cabarrocas
(2)