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Communication Dans Un Congrès Année : 2019

Tunnel Oxide Modification During PECVD Poly-Si Deposition for Passivating Contacts

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hal-04404225 , version 1 (18-01-2024)

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  • HAL Id : hal-04404225 , version 1

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Anatole Desthieux, Jorge Posada, Pierre-Philippe Grand, Cédric Broussillou, Barbara Bazer-Bachi, et al.. Tunnel Oxide Modification During PECVD Poly-Si Deposition for Passivating Contacts. JNPV 2019, Dec 2019, Dourdan, France. ⟨hal-04404225⟩
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