EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging - Archive ouverte HAL
Article Dans Une Revue Sensors Année : 2021

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

Résumé

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

Dates et versions

hal-04382639 , version 1 (09-01-2024)

Identifiants

Citer

Ombeline de La Rochefoucauld, Guillaume Dovillaire, Fabrice Harms, Mourad Idir, Lei Huang, et al.. EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging. Sensors, 2021, 21 (3), pp.874. ⟨10.3390/s21030874⟩. ⟨hal-04382639⟩
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