Thermal contact resistance measurements on metal-semiconductor structures by scanning thermal microscopy and 3ω method - Archive ouverte HAL
Communication Dans Un Congrès Année : 2023

Thermal contact resistance measurements on metal-semiconductor structures by scanning thermal microscopy and 3ω method

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hal-04311000 , version 1 (28-11-2023)

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  • HAL Id : hal-04311000 , version 1

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Juan Carlos Acosta Abanto, Mélanie Brouillard, Marc Dewitte, Jean-François Robillard, Nicolas Horny, et al.. Thermal contact resistance measurements on metal-semiconductor structures by scanning thermal microscopy and 3ω method. Trends in Nanotechnologies (TNT), Aug 2023, Villeurbanne, France. ⟨hal-04311000⟩
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