Effect of annealing temperature on morphological and microstructural properties of CrN-MoN multilayers deposited by reactive magnetron sputtering - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2023
Fichier non déposé

Dates et versions

hal-04291487 , version 1 (17-11-2023)

Identifiants

  • HAL Id : hal-04291487 , version 1

Citer

Rubenson Mareus, Amael Caillard, Anne-Lise Thomann, Gaëlle Rosiere, Caroline Richard, et al.. Effect of annealing temperature on morphological and microstructural properties of CrN-MoN multilayers deposited by reactive magnetron sputtering. PLATHINIUM (Plasma Thin film International Union Meeting), Sep 2023, Antibes, France. ⟨hal-04291487⟩
10 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More