Writing chiral nanostructures inside silica with polarization-engineered Bessel beams
Résumé
The fabrication of chiral optical elements is a key element in optics
and photonics to enrich the portfolio of tools enabling the control or
detection of atoms, molecules and solids with light. Pioneering work has
already demonstrated that ultrafast laser written nanogratings in
silica can exhibit chiral optical properties [1]. However, the tailoring
of these chiral optical properties is highly restricted when writing
with conventional femtosecond (fs) Gaussian beams because of the
relatively small optical thickness. Recently, a multi-layer fs laser
writing strategy has demonstrated new opportunities to reach high
chiroptic properties