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Article Dans Une Revue IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems Année : 1992

Adaptive mesh refinement for multilayer process simulation using the finite element method

Résumé

An adaptive mesh refinement technique is proposed for a two-dimensional finite-element multilayer process simulator. Mesh refinement is based on the dopant concentration ratio inside each element, together with a prediction technique, minimizing the interpolation errors. A significant reduction in CPU time is obtained by automatic grid refresh. Several methods were tested. The mesh adequacy is evaluated with bipolar test structures using analytical punch-through voltage calculations. Applications of these methods are presented in two ways. First, an advanced trench-isolated polysilicon bipolar transistor was simulated to show the general possibilities of the techniques, and second, a coupled process and device simulation approach allows the evaluation of the scheme on real structures in relation to experimental measurements.
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Dates et versions

hal-04246676 , version 1 (17-10-2023)

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Citer

B. Baccus, D. Collard, Emmanuel Dubois. Adaptive mesh refinement for multilayer process simulation using the finite element method. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1992, 11 (3), pp.396-403. ⟨10.1109/43.124426⟩. ⟨hal-04246676⟩
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