Characterization of the electrical behaviour of thin dielectric films at nanoscale using technics methods derived from Atomic Force Microscopy : application to plasma deposited AgNPs-based nanocomposites - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2018

Characterization of the electrical behaviour of thin dielectric films at nanoscale using technics methods derived from Atomic Force Microscopy : application to plasma deposited AgNPs-based nanocomposites

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hal-04157438 , version 1 (10-07-2023)

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Christina Villeneuve-Faure, Kremena Makasheva, Cédric Djaou, Laurent Boudou, Gilbert Teyssedre. Characterization of the electrical behaviour of thin dielectric films at nanoscale using technics methods derived from Atomic Force Microscopy : application to plasma deposited AgNPs-based nanocomposites. 13th Nanotechnology Materials & Devices Conference (NMDC 2018), Oct. 14-17, 2018, Portland, OR (USA), 2018, Portland, United States. pp.413-416. ⟨hal-04157438⟩
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