How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmas - Archive ouverte HAL
Communication Dans Un Congrès Année : 2023

How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmas

Corinne Gablin
Alexandre Téolis
Thierry Delair
Yann Chevolot
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Dates et versions

hal-04151212 , version 1 (04-07-2023)

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  • HAL Id : hal-04151212 , version 1

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Didier Léonard, Paule Durin, Olha Sysova, Yue Guan, Corinne Gablin, et al.. How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmas. Thermec, Jul 2023, Vienne, Austria. ⟨hal-04151212⟩
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