Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning Processes - Archive ouverte HAL Accéder directement au contenu
Poster De Conférence Année : 2022

Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning Processes

Corinne Gablin
Alexandre Teolis
Thierry Delair
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Dates et versions

hal-04151194 , version 1 (04-07-2023)

Identifiants

  • HAL Id : hal-04151194 , version 1

Citer

Paule Durin, Corinne Gablin, Aziz Benamrouche, Samar Hajjar-Garreau, Alexandre Teolis, et al.. Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning Processes. JNTE, Nov 2022, Besançon, France, France. ⟨hal-04151194⟩
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