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Investigation of gas flow pattern in a Micro-Hollow Cathode Discharge-based deposition reactor using planar Laser Induced Fluorescence

Résumé

A micro-hollow cathode discharge (MHCD), ignited in an Ar/N2 gas mixture, is used to produce atomic nitrogen in a Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor for hexagonal boron nitride synthesis. To expand the plasma volume of the MHCD and transport the species onto the substrate, a pressure differential is introduced between the two sides of the MHCD, creating a plasma jet. Two dimensional spatial mappings of the atomic nitrogen density in the deposition chamber showed an unexpected density profile, presumably due to the gas flow pattern. To better understand the gas flow effect, Planar Laser Induced Fluorescence is used on acetone to visualize the gas flow structure in the deposition chamber.
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Dates et versions

hal-04134190 , version 1 (20-06-2023)

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Copyright (Tous droits réservés)

Identifiants

  • HAL Id : hal-04134190 , version 1

Citer

Alice Remigy, Belkacem Menacer, Abd-Almalik Halfaoui, Gérard Bauville, Laurent Invernizzi, et al.. Investigation of gas flow pattern in a Micro-Hollow Cathode Discharge-based deposition reactor using planar Laser Induced Fluorescence. 35th International Conference on Phenomena in Ionized Gases (ICPIG 35), Jul 2023, Egmond aan Zee, Netherlands. . ⟨hal-04134190⟩
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