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Communication Dans Un Congrès Année : 2009

APGD and APTD for the deposition of silicon based thin films from N2O/HMDSO mixtures: application to gas-barrier layers

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Plasmas
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hal-03988381 , version 1 (14-02-2023)

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  • HAL Id : hal-03988381 , version 1

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Nicolas Gherardi, Louison Maechler, Christian Sarra-Bournet, Nicolas Naudé, F. Massines. APGD and APTD for the deposition of silicon based thin films from N2O/HMDSO mixtures: application to gas-barrier layers. ISPC 19: 19th International Symposium on Plasma Chemistry, Bochum, Germany., 2009, Bochum, Germany. ⟨hal-03988381⟩
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