Soft Nano‐Imprint Lithography of Rare‐Earth‐Doped Light‐Emitting Photonic Metasurface
Résumé
Sol–gel chemistry and nano-imprint lithography (soft-NIL) can be combined
for the fabrication of nano-patterns with large vertical aspect ratio over large
scales. The possibility to frame via soft-NIL metal oxides materials featuring
a large refractive index and low absorption coefficient, opens new avenues for
light management. In spite of its importance, the integration of light emitters
in these materials has been mostly investigated in flat layers, limiting their
efficiency and versatility. Here it is shown that ZrO 2 can be combined with
light emitting Eu 3+ ions and framed via soft-NIL to form large arrays of pillars
atop a 2D residual layer. The chemical precursor solutions and the nano-
imprint technique are developed for photonic metasurfaces sustaining sharp
resonances ascribed to quasi-guided modes and lattice modes, as accounted
for by finite difference time domains simulations. These resonances enable
for a record extraction of the Eu 3+ forward emission up to ≈200 times with
respect to the flat counterpart within a relatively small detection angle (≈ ±16°
around the vertical direction). These results are relevant for light-emitting
displays, down- and up-conversion processes for light detection such as scin-
tillators for X-ray and for light amplifiers based on rare-earth emitters.
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Chehadi Adv. Optical Mater. 2022, 2201618 - Soft Nano‐Imprint Lithography of Rare‐Earth‐Doped Light‐Emitting Photonic.pdf (4.73 Mo)
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