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Article Dans Une Revue Materials Science and Technology Année : 2013

Polysilicon in situ phosphorus doping control over large concentration range using low temperature, low pressure chemical vapour deposition growth process

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hal-03776583 , version 1 (13-09-2022)

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D. Briand, M. Sarret, F. Le Bihan, O. Bonnaud, L. Pichon. Polysilicon in situ phosphorus doping control over large concentration range using low temperature, low pressure chemical vapour deposition growth process. Materials Science and Technology, 2013, 11 (11), pp.1207-1209. ⟨10.1179/mst.1995.11.11.1207⟩. ⟨hal-03776583⟩
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