MOCVD-Fabricated TiO2 Thin Films: Influence of Growth Conditions on Fibroblast Cells Culture - Archive ouverte HAL Access content directly
Journal Articles Molecular Crystals and Liquid Crystals Year : 2008

MOCVD-Fabricated TiO2 Thin Films: Influence of Growth Conditions on Fibroblast Cells Culture

Simona Popescu
  • Function : Author
Ioana Demetrescu
  • Function : Author
V. Mitran
  • Function : Author

Abstract

TiO2 thin films with various morphologies were grown on Ti substrates by the LP-MOCVD technique (Low Pressure Chemical Vapour Deposition from Metal-Organic precursor), with titanium tetra-iso-propoxide as a precursor. All the films were prepared in the same conditions except the deposition time. They were characterized by X-ray diffraction, scanning electron microscopy, optical 15 interferometry, water contact angle measurements. MOCVD-fabricated TiO2 thin films are known to be adapted to cell culture for implant requirements. Human gingival fibroblasts were cultured on the various TiO2 deposits. Differences in cell viability (MTT tests) and cell spreading (qualitative assessment) were observed and related to film roughness, wettability and allotropic composition.
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Dates and versions

hal-03578423 , version 1 (17-02-2022)

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Simona Popescu, Ioana Demetrescu, V. Mitran, Alain Gleizes. MOCVD-Fabricated TiO2 Thin Films: Influence of Growth Conditions on Fibroblast Cells Culture. Molecular Crystals and Liquid Crystals, 2008, 483, pp.266-274. ⟨10.1080/15421400801914301⟩. ⟨hal-03578423⟩
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