There is a great interest for multilayer hard coatings because they exhibit enhanced properties resulting from their nanostructuration. Such coatings are frequently constituted of carbide and nitride and are generally deposited under very low pressure by plasma and PVD processes. These vacuum techniques enable the growth of heterostructures with nanometric thick individual layers and sharp interfaces, which are two requirements for advanced performances. However, both to develop more economical processes and with the goal of continuous deposition applications, the CVD processes operating under atmospheric pressure are particularly attractive. In this paper we show that the combination of pulsed direct liquid injection and the use of metalorganic precursor (DLI-MOCVD) is a promising route for the growth of nanostructured multilayer coatings under atmospheric pressure. Chromium metal as well as chromium carbide and nitrides monolithic coatings have been deposited at 773 K by this process using liquid solution of bis(benzene) chromium as Cr molecular precursor. Then, CrCx/CrN nanostructured multilayer coatings with a bilayer period as low as 50 nm have been grown. Structural characterizations and preliminary mechanical properties of these metallurgical coatings are discussed.