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Article Dans Une Revue IOP Conference Series: Materials Science and Engineering Année : 2018

Effects of substrate heating and post-deposition annealing on characteristics of thin MOCVD HfO 2 films

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Matériaux

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hal-03548692 , version 1 (30-01-2022)

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Venkata Virajit Garbhapu, Sundararaman Gopalan, Sivaramakrishnan Ramesh, Shibesh Dutta. Effects of substrate heating and post-deposition annealing on characteristics of thin MOCVD HfO 2 films. IOP Conference Series: Materials Science and Engineering, 2018, 310, pp.012125. ⟨10.1088/1757-899X/310/1/012125⟩. ⟨hal-03548692⟩
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