Impact of Nanosecond Laser Annealing on the Formation of Titanium Silicides - Archive ouverte HAL
Communication Dans Un Congrès Année : 2021

Impact of Nanosecond Laser Annealing on the Formation of Titanium Silicides

Résumé

In view of contacts for advanced image sensors, the formation of Ti silicides is explored by means of nanosecond laser annealing (NLA) combined to rapid thermal processing (RTP) to tentatively obtain ohmic contacts within a limited thermal budget. Leveraging sheet resistance and X-ray diffraction measurements, coupled to electron microscopy observations, the various phases obtained after NLA and after a subsequent RTP are identified and the involved mechanisms discussed.

Domaines

Matériaux
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Dates et versions

hal-03454117 , version 1 (29-11-2021)

Identifiants

Citer

Laura Esposito, Sebastien Kerdiles, Magali Gregoire, Dominique Mangelinck. Impact of Nanosecond Laser Annealing on the Formation of Titanium Silicides. 2021 20th International Workshop on Junction Technology (IWJT), Jun 2021, Kyoto, France. pp.1-6, ⟨10.23919/IWJT52818.2021.9609410⟩. ⟨hal-03454117⟩
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