Deposition using pulsed regime in magnetron sputtering : principle, characteristics and comparison with pulsed-electron and pulsed laser deposition - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2021

Deposition using pulsed regime in magnetron sputtering : principle, characteristics and comparison with pulsed-electron and pulsed laser deposition

Domaines

Matériaux Plasmas
Fichier non déposé

Dates et versions

hal-03436398 , version 1 (19-11-2021)

Identifiants

  • HAL Id : hal-03436398 , version 1

Citer

Amael Caillard, Eric Millon, Christophe Cachoncinlle. Deposition using pulsed regime in magnetron sputtering : principle, characteristics and comparison with pulsed-electron and pulsed laser deposition. EMRS, Jun 2021, virtual, France. ⟨hal-03436398⟩
11 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More