Thermal properties study of silicon nanostructures by photoacoustic techniques - Archive ouverte HAL
Article Dans Une Revue Journal of Applied Physics Année : 2020

Thermal properties study of silicon nanostructures by photoacoustic techniques

Résumé

The photoacoustic method with piezoelectric detection for the simultaneous evaluation of the thermophysical properties is proposed. The approach is based on the settling of an additional heat sink for redistribution of heat fluxes deposited on the sample surface. First, the approach was tested on the porous silicon with well-defined morphology and well-studied properties. Then, heat capacity and thermal conductivity of silicon nanowire arrays were investigated by recovering the experimental data through numerical simulations. The decrease in heat capacity and effective thermal conductivity of the samples upon increasing thickness and porosity of the sample was observed. Such a behavior could be caused by the increase of the structure heterogeneity. In particular, this can be related to a larger disorder (increased density of broken nanowires and larger porosity) that appears during the etching process of the thick layers.
Fichier principal
Vignette du fichier
2020_JAP_PA_nano-Si.pdf (2.37 Mo) Télécharger le fichier
Origine Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-03418227 , version 1 (03-12-2020)
hal-03418227 , version 2 (06-11-2021)

Identifiants

Citer

K Dubyk, T Nychyporuk, V Lysenko, Konstantinos Termentzidis, Guillaume Castanet, et al.. Thermal properties study of silicon nanostructures by photoacoustic techniques. Journal of Applied Physics, 2020, 127 (22), pp.225101. ⟨10.1063/5.0007559⟩. ⟨hal-03418227v2⟩
153 Consultations
129 Téléchargements

Altmetric

Partager

More