Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of nanocomposite thin films from ethyl lactate and silica nanoparticles
Résumé
Nanocomposite coatings are made by Atmospheric Pressure PECVD from ethyl lactate (EL) and silica nanoparticles (NPs) in a Dielectric Barrier Discharge (DBD) using Frequency Shift Keying (FSK) to alternate between 1 and 15 kHz voltages. In-situ plasma FTIR and thin film FTIR, SEM, AFM and profilometry show that (i) 1 kHz DBD mainly deposits NPs, 15 kHz only polymerizes EL (ii) the EL polymerization rate is the same in FSK and continuous modes (iii) despite the 50/50 contribution of both frequencies, the NPs deposit is 3 times faster in FSK mode than in 1 kHz DBD and compared to 1 and 15 kHz coatings, in the nanocomposite, NPs Si-O-Si and EL C=O bonds per unit length are equal to 68 and 34% respectively. In-situ FTIR 2 detects SiO2 NPs, their functionalization, and the formation of CO2.
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