Aerosol-assisted plasmas can be used to produce a wide variety of thin films, including homogeneous, nanotextured and/or nanocomposite coatings. For example, the nebulization of colloidal solutions, i.e. liquid solutions containing nanoparticles, in plane-to-plane dielectric barrier discharge (DBD) at atmospheric pressure has been used for nanocomposite thin film deposition [1]. However, nanoparticles-loaded droplets in the aerosol lead to the deposition of aggregated nanoparticles embedded in the matrix [1]. Recently, a new process of nanoparticles injection in plasmas has been developed [2]. This method consists in synthesizing the nanoparticles prior to their injection in the plasma in a pulsed injection regime. However, the impacts of the pulsed aerosol injection on the DBD are still opening questions. This work aims to study a pulsed-aerosol-assisted DBD deposition process. In contrast with the continuous nebulization of solutions, pulsed injection causes a sudden increase of the quantity of precursor as droplets in the inter-electrode space – the average velocity being in the 10 m.s-1 range. We observed that depending on the process parameters (injection times, pulse frequency, continuous gas flow rate, etc.), the discharge stability is modified. Consequently, these parameters are also critical for transport and evaporation of the droplets and so on the thin film deposition (here ppHMDSO). For example, by varying the different parameters of the pulsed-aerosol-assisted DBD, we observe that the deposit can consist in different phases (liquid and solid) as a function of the transport of the aerosol and the thickness of the deposited layer. Similar studies are also performed with pentane for amorphous carbon thin film.