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Communication Dans Un Congrès Année : 2021

High energy density deposition inside the bulk of dielectrics via resonance absorption

Résumé

Ultrafast laser processing of nanochannels and nanovoids in the bulk of dielectrics such as fused silica, glass orsapphire is highly desirable for a number of applications such as stealth dicing, nano-fluidics or nano-photonics.It was demonstrated more than 10 years ago that high angle femtosecond Bessel beams can generate high aspectratio with only a single laser pulse. However the exact mechanism of energy deposition was still lacking. Indeed,most numerical models were predicting defocussing of the pulse on the plasma, and very weak energy densitydeposition which was incompatible with the experimental result using an imaging technique developed in [1].
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Dates et versions

hal-03360060 , version 1 (30-09-2021)

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  • HAL Id : hal-03360060 , version 1

Citer

Mostafa Hassan, Kazem Ardaneh, Rémi Meyer, Chen Xie, Cyril Billet, et al.. High energy density deposition inside the bulk of dielectrics via resonance absorption. Conference on Lasers and Electro-Optics/Europe and the European Quantum Electronics Conference, Jun 2021, Munich, Germany. ⟨hal-03360060⟩
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