[Invited] Material processing by atmospheric pressure plasma jets - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2019

[Invited] Material processing by atmospheric pressure plasma jets

Résumé

Plasma Enhanced Chemical Vapour Deposition (PECVD) processes have been used for decades for surface processing in a wide range of industrial applications like semiconductor films, low-k films, barrier diffusion. Thin film deposition is especially of high interest for biomedical applications for the production of protective coatings, adhesion layers, hydrophilic or hydrophobic layers. Up to now, beside DBD type treatment of textiles or food-dedicated films, most of used processes are usually realized at low pressure, as so many time beautifully reported by Riccardo D’Agostino and co-workers. Actually, there is a great and increasing interest in the development of plasma sources operating at atmospheric pressure. In this talk, we will present results related with plasma polymerization, plasma deposition and plasma surface modification realized with an atmospheric pressure plasma jet (APPJ), the Plasma Gun developed at GREMI.
Fichier principal
Vignette du fichier
ISPlasma2019_Abstract JM Pouvesle D'Agostino session.pdf (452.98 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-02958285 , version 1 (14-12-2020)

Identifiants

  • HAL Id : hal-02958285 , version 1

Citer

Jean-Michel Pouvesle, Azadeh Valinataj-Omran, Céline Vivien, Sébastien Dozias, Robert Eric. [Invited] Material processing by atmospheric pressure plasma jets. Workshop in memory of R. d'Agostino, Nagoya Institue of Technology, Mar 2019, Nagoya, Japan. ⟨hal-02958285⟩
27 Consultations
25 Téléchargements

Partager

Gmail Facebook X LinkedIn More