‘Raman characterization before and after rapid thermal annealing of CeO2 thin films grown by rf sputtering on (111) Si’

Y. Guhel; M.T. Ta; J. Bernard; B. Boudart; J.C. Pesant

Journal Articles Journal of Raman Spectroscopy Year : 2009

‘Raman characterization before and after rapid thermal annealing of CeO2 thin films grown by rf sputtering on (111) Si’

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1

Y. Guhel

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Laboratoire Universitaire des Sciences Appliquées de Cherbourg

M.T. Ta

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J. Bernard

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B. Boudart

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J.C. Pesant

Function : Author

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Engineering Sciences [physics]

Yannick Guhel : Connect in order to contact the contributor

https://hal.science/hal-02936064

Submitted on : Friday, September 11, 2020-12:13:08 AM

Last modification on : Wednesday, March 9, 2022-2:14:03 PM

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hal-02936064 , version 1 (11-09-2020)

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HAL Id : hal-02936064 , version 1

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Y. Guhel, M.T. Ta, J. Bernard, B. Boudart, J.C. Pesant. ‘Raman characterization before and after rapid thermal annealing of CeO2 thin films grown by rf sputtering on (111) Si’. Journal of Raman Spectroscopy, 2009. ⟨hal-02936064⟩

‘Raman characterization before and after rapid thermal annealing of CeO2 thin films grown by rf sputtering on (111) Si’

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