We leverage the attractive properties of a high χ-low N BCP, i.e. poly(styrene)-block-poly(2-fluoro ethyl methylacrylate) (PS-b-P2FEMA) and illustrate its utility for next-generation nano-manufacturing. The synthesis, physical characterization and thin film self-assembly of a series of lamellar and cylindrical PS-b-P2FEMA BCPs is delineated. PS-b-P2FEMA BCPs with total molecular weights ranging from 7 kg mol -1 to 22 kg mol -1 were synthesized using reversible-addition-fragmentation chain-transfer (RAFT) polymerization. Temperature resolved small angle X-ray scattering (SAXS) measurements revealed a large χ value (0.13@ 150°C) for PS-b-P2FEMA. Solvo-thermal vapor annealing of PS-b-P2FEMA films produced highly oriented fingerprint patterns in as short as 60 seconds. Lamellar period sizes ranged from 25.9 nm down to 14.2 nm with feature sizes as small as 7 nm observed. We also demonstrate the integration feasibility of PS-b-P2FEMA BCPs through alumina hardmask formation using sequential infiltration synthesis. The highly favorable characteristics of the P2FEMA based BCPs detailed here provide a versatile material option to the current library of available BCPs for sub-10 nm nanolithography.