Modelling of tailored ion energy distributions for plasma processing applications - Archive ouverte HAL
Communication Dans Un Congrès Année : 2016

Modelling of tailored ion energy distributions for plasma processing applications

P. Diomede
  • Fonction : Auteur
Trevor Lafleur
Jean-Paul Booth
S. Longo
  • Fonction : Auteur
D. J. Economou
  • Fonction : Auteur

Résumé

Several modeling techniques were employed to calculate ion energy distributions on plasma electrodes under different configurations used to obtain a desired (tailored) distribution. In particular, hybrid Particle in Cell with Monte Carlo Collisions (PIC-MCC)/fluid simulations were performed in a combined computational–experimental study of capacitively coupled plasmas sustained by tailored voltage waveforms, PIC/MCC simulations were employed to study pulsed plasmas with the application of a synchronous bias on a boundary electrode in the afterglow and a semianalytic model was developed to study plasmas sustained by independent sources in contact with a substrate electrode with a tailored bias voltage waveform.
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Dates et versions

hal-02573353 , version 1 (14-05-2020)

Identifiants

  • HAL Id : hal-02573353 , version 1

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P. Diomede, Trevor Lafleur, Jean-Paul Booth, S. Longo, D. J. Economou. Modelling of tailored ion energy distributions for plasma processing applications. ESCAMPIG, Jul 2016, Bratislava, Slovakia. ⟨hal-02573353⟩
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