Modelling of tailored ion energy distributions for plasma processing applications
Résumé
Several modeling techniques were employed to calculate ion energy distributions on plasma electrodes under different configurations used to obtain a desired (tailored) distribution. In particular, hybrid Particle in Cell with Monte Carlo Collisions (PIC-MCC)/fluid simulations were performed in a combined computationalexperimental study of capacitively coupled plasmas sustained by tailored voltage waveforms, PIC/MCC simulations were employed to study pulsed plasmas with the application of a synchronous bias on a boundary electrode in the afterglow and a semianalytic model was developed to study plasmas sustained by independent sources in contact with a substrate electrode with a tailored bias voltage waveform.