Deterministic placement of ultra-bright near-infrared color centers in arrays of silicon carbide micropillars
Résumé
We report the enhancement of the optical emission between 850 and 1400 nm of an ensemble of silicon mono-vacancies (V Si), silicon and carbon divacancies (V C V Si), and nitrogen vacancies (N C V Si) in an n-type 4H-SiC array of micropillars. The micropil-lars have a length of ca. 4.5 μm and a diameter of ca. 740 nm, and were implanted with H + ions to produce an ensemble of color centers at a depth of approximately 2 μm. The samples were in part annealed at different temperatures (750 and 900 °C) to selectively produce distinct color centers. For all these color centers we saw an enhancement of the photostable fluorescence emission of at least a factor of 6 using micro-photoluminescence systems. Using custom confocal microscopy setups, we characterized the emission of V Si measuring an enhancement by up to a factor of 20, and of N C V Si with an enhancement up to a factor of 7. The experimental results are supported by finite element method simulations. Our study provides the pathway for device design and fabrication with an integrated ultra-bright ensemble of V Si and N C V Si for in vivo imaging and sensing in the infrared. 2383
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