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Poster De Conférence Année : 2019

Electrical and optical characterization of a capacitively-coupled RF plasma with a pulsed argon gas injection

Résumé

Nanocomposite thin film deposition using a reactor-injector of nanoparticles implies a pulsed gas injection. In a plasma, this can affect the behavior of the downstream process. Here, the case of an asymmetric low-pressure RF plasma with a pulsed argon gas injection is analyzed by electrical and optical emission spectroscopy measurements. It is found that this injection mode can highly affect the plasma stability: both the electron temperature and density are modified during the rise and the decrease of the gas pressure. A new injection mode combining continuous and pulsed injections is proposed to obtain more stable conditions.
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Dates et versions

hal-02330662 , version 1 (24-10-2019)

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  • HAL Id : hal-02330662 , version 1

Citer

Sadek Thibault, Guillaume Carnide, Myrtil L. Kahn, Luc Stafford. Electrical and optical characterization of a capacitively-coupled RF plasma with a pulsed argon gas injection. 24th International Symposium on Plasma Chemistry (ISPC), Jun 2019, Napoli, Italy. Proceeding of the International Syposium on Plasma Chemistry, P2-63, 2019, Proceeding of the International Syposium on Plasma Chemistry. ⟨hal-02330662⟩
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