Resistive-nanoindentation: contact area monitoring by real-time electrical contact resistance measurement - Archive ouverte HAL
Article Dans Une Revue MRS Communications Année : 2019

Resistive-nanoindentation: contact area monitoring by real-time electrical contact resistance measurement

Résumé

In the past decades, efforts have been made to couple nanoindentation with resistive measurements in order to monitor the real-time contact area, as an alternative to the use of traditional analytical models. In this work, a novel and efficient stand-alone method is proposed to compute contact area using resistive-nanoindentation of noble metals (bulk or thin films). This method relies on three steps: tip shape measurement, setup calibration, application to the sample to be characterized. The procedure is applied to nanoindentation tests on a sample with film-on-elastic-substrate rheology and is successfully validated against experimental measurements of the contact area.

Domaines

Matériaux
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Dates et versions

hal-02307545 , version 1 (07-10-2019)

Identifiants

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Solène Comby-Dassonneville, Fabien Volpi, Guillaume Parry, Didier Pellerin, Marc Verdier. Resistive-nanoindentation: contact area monitoring by real-time electrical contact resistance measurement. MRS Communications, 2019, ⟨10.1557/mrc.2019.74⟩. ⟨hal-02307545⟩
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