Resistive-nanoindentation: contact area monitoring by real-time electrical contact resistance measurement
Résumé
In the past decades, efforts have been made to couple nanoindentation with resistive measurements in order to monitor the real-time contact area, as an alternative to the use of traditional analytical models. In this work, a novel and efficient stand-alone method is proposed to compute contact area using resistive-nanoindentation of noble metals (bulk or thin films). This method relies on three steps: tip shape measurement, setup calibration, application to the sample to be characterized. The procedure is applied to nanoindentation tests on a sample with film-on-elastic-substrate rheology and is successfully validated against experimental measurements of the contact area.
Domaines
Matériaux
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Resistive-nanoindentation - contact area monitoring _MRS Communications.pdf (730.02 Ko)
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