High-pressure, high temperature insertion of bismuth in the siliceous zeolite silicalite-1 - Archive ouverte HAL
Article Dans Une Revue Solid State Sciences Année : 2019

High-pressure, high temperature insertion of bismuth in the siliceous zeolite silicalite-1

Sébastien Clément
Pierre Toulemonde
Arie van Der Lee

Résumé

A silicalite-1/bismuth composite was synthesized by insertion of liquid bismuth in the 5.5 Å diameter pores of the zeolite under high-pressure, high-temperature conditions. The insertion of bismuth stabilizes the structure with respect to pressure-induced amorphization. Transmission electron microscopy indicated the presence of chains of atoms, which correspond to the 5.5 Å diameter of the host silicalite-1 structure. Neutron powder diffraction also confirmed the insertion of Bi in the pores of silicalite-1. Density functional theory calculations indicate that the insertion of bismuth results in formation of chains with short and long Bi-Bi distances in the pores of the host silicalite-1 linked to the framework by van der Waal's interactions. The material is predicted to be a semiconductor with a band gap of 0.4 eV.
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Dates et versions

hal-02305569 , version 1 (21-12-2020)

Identifiants

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Yixuan Zhao, Sébastien Clément, Vasyl Veremeienko, Pierre Toulemonde, Thomas Hansen, et al.. High-pressure, high temperature insertion of bismuth in the siliceous zeolite silicalite-1. Solid State Sciences, 2019, 97, pp.106001. ⟨10.1016/j.solidstatesciences.2019.106001⟩. ⟨hal-02305569⟩
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