Top-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation - Archive ouverte HAL Access content directly
Journal Articles Applied Physics Express Year : 2019

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hal-02304928 , version 1 (03-10-2019)

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Benjamin Damilano, Pierre-Marie Coulon, Stephane Vézian, Virginie Brandli, Jean-Yves Duboz, et al.. Top-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation. Applied Physics Express, 2019, 12 (4), pp.045007. ⟨10.7567/1882-0786/ab0d32⟩. ⟨hal-02304928⟩
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