Control of the mechanical stress induced by dielectric thin films to engineer optical properties in semiconductor materials and devices [Defense 24.01.2023]
Control of the mechanical stress induced by dielectric thin films to engineer optical properties in semiconductor materials and devices [Soutenance 24.01.2023]
Résumé
supervisor Jean-pierre Landesman (department of materials - nanosciences), Christophe Levallois (FOTON-INSA) and Peter Mascher
(McMaster University)
sous la direction de Jean-pierre Landesman dans le département Matériaux-Nanosciences, Christophe Levallois (FOTON-INSA) et Peter Mascher
(McMaster University)