Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement - Archive ouverte HAL
Article Dans Une Revue Beilstein Journal of Nanotechnology Année : 2013

Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement

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Chimie

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hal-02148649 , version 1 (05-06-2019)

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Cathy Bugot, Nathanaelle Schneider, Daniel Lincot, Frédérique Donsanti. Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement. Beilstein Journal of Nanotechnology, 2013, 4, pp.750-757. ⟨10.3762/bjnano.4.85⟩. ⟨hal-02148649⟩
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