The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Physical Chemistry C Année : 2019

The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar

Rik V Mom
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Philippe Sautet
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Stephan N. Steinmann
Irene M N Groot
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Résumé

Functionalizing noble metal surfaces with (bio-)organic molecules is a vibrant field of research, with key applications in medicine, catalysis and molecular electronics. Control over the molecular self-assembly is essential to create functional devices. Here, we exploit our high-pressure, high-temperature scanning tunneling microscope (STM) to relate the effects of controllable parameters (temperature and pressure) to atomic-scale assembly mechanisms. Using methanethiol self-assembly on Au(111) as a model system, we monitor the formation and assembly of the ubiquitous (CH 3 S) 2 Au "staple" motif into row structures at pressures up to 1 bar. We observe a pressure-induced transition from the usual 1 /3 monolayer (ML) saturation coverage in vacuum to 3 /8 ML at 1 bar, thus providing the first evidence for a pressure gap effect for thiol adsorption. Complementing our experiments, we employed dispersion-corrected density functional theory computations to model the formed surface adlayers, corresponding STM images and the underlying equilibrium thermodynamics.
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Dates et versions

hal-02125523 , version 1 (10-05-2019)

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Rik V Mom, Sigismund Melissen, Philippe Sautet, Joost J.W.M. Frenken, Stephan N. Steinmann, et al.. The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar. Journal of Physical Chemistry C, 2019, ⟨10.1021/acs.jpcc.9b03045⟩. ⟨hal-02125523⟩
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