Characterizations of CNx thin films made by ionized physical vapor deposition
Résumé
Thin films of CNx deposited by physical vapor deposition (PVD) with different contents of nitrogen have been studied. An RF-powered
antenna was added to a classical magnetron sputtering system. The addition of an antenna plays an important role in mechanical and
physicochemical properties. The films have been characterized using XPS, AFM, Brillouin light scattering, grazing angle FTIR, and
wettability test. The results show in particular that the Rayleigh wave velocity determined by BLS increased when deposit is assisted by the
antenna. Refractive index and surface tension are also enhanced with the use of an antenna. Moreover, high deposition rates are obtain with
antenna without modification of N/C ratio.