Measure and analysis of 4H-SiC Schottky barrier height with Mo contacts - Archive ouverte HAL
Article Dans Une Revue European Physical Journal: Applied Physics Année : 2019

Measure and analysis of 4H-SiC Schottky barrier height with Mo contacts

Résumé

Current-voltage (I-V) and capacitance-voltage (C-V) characteristics of Schottky Mo/4H-SiC diodes have been measured and analyzed as a function of temperature between 80 K and 400 K. The I-V characteristics significantly deviate from ideal characteristics predicted by the thermionic emission model because of the inhomogeneity of Schottky contact. After a brief review of the different existing models, the main parameters (ideality factor, barrier height, effective Richardson constant) of both diodes have been extracted in the frame of a Gaussian barrier height distribution model, whose mean and standard deviation are linearly dependent on voltage and temperature, as well as in the context of the potential fluctuation model. The results are compared with the values extracted by C-V and the values in the literature. A link is established between these two models. Diodes of different I-V characteristics, either identified as single barrier or double barrier, have been analyzed by DLTS to investigate the deep level defects present. No noticeable difference has been found. Keywords -Schottky-SiC-I-V-C-V-thermionic-emission-barrier height-DLTS.

Domaines

Electronique
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Dates et versions

hal-02047099 , version 1 (23-02-2019)

Identifiants

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Teng Zhang, Christophe Raynaud, Dominique Planson. Measure and analysis of 4H-SiC Schottky barrier height with Mo contacts. European Physical Journal: Applied Physics, 2019, 85 (1), pp.10102. ⟨10.1051/epjap/2018180282⟩. ⟨hal-02047099⟩
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