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Article Dans Une Revue Journal of the European Ceramic Society Année : 1997

Influence of the Aminated Conditions on the pH Sensitivity of Silica and Amorphous Silicon Film

N. Jaffrezic-Renault
E. Fourmond
M. Lemiti
F.F. Grekov
  • Fonction : Auteur

Résumé

Silicon nitride has been widely used as a pH sensitive membrane of the ion sensitive field e#ect transistor (ISFET) thanks to the high reactivity of the SiNH2 sites to the H f ions. In this paper, we report experimental results on the H+ sensitivity of silica and amorphous silicon aminated films, obtained by the photo-CVD. We have studied the dependence of their response to pH as a function of the time and the temperature of amination of thejIm. The response of the aminatedjilms (silica and amorphous silicon) is quasi-Nernstian for amination exposure time higher than 1 min, deposited at temperature lower than 200°C. A theoretical model of deposition is presented. It can explain the influence of the deposition conditions. Published by Elsevier Science Limited.
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Dates et versions

hal-01974244 , version 1 (12-02-2019)

Identifiants

  • HAL Id : hal-01974244 , version 1

Citer

Z.M. Baccar, N. Jaffrezic-Renault, E. Fourmond, M. Lemiti, F.F. Grekov. Influence of the Aminated Conditions on the pH Sensitivity of Silica and Amorphous Silicon Film. Journal of the European Ceramic Society, 1997, 17 (15-16), pp.202 - 2024. ⟨hal-01974244⟩
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