Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering : the influence of self-bias voltage on reflectivity and roughness - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Physics: Condensed Matter Année : 2001

Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering : the influence of self-bias voltage on reflectivity and roughness

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Matériaux
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Dates et versions

hal-01951281 , version 1 (11-12-2018)

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  • HAL Id : hal-01951281 , version 1

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Magali Putero, B. Vidal. Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering : the influence of self-bias voltage on reflectivity and roughness. Journal of Physics: Condensed Matter, 2001, 13, pp.3969-3976. ⟨hal-01951281⟩
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