First silicide formed by reaction of Ni(13%Pt) films with Si(100): Nature and kinetics by in-situ X-ray reflectivity and diffraction - Archive ouverte HAL
Article Dans Une Revue Scripta Materialia Année : 2010

First silicide formed by reaction of Ni(13%Pt) films with Si(100): Nature and kinetics by in-situ X-ray reflectivity and diffraction

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Matériaux

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hal-01951270 , version 1 (11-12-2018)

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Magali Putero, L. Ehouarne, E. Ziegler, Dominique Mangelinck. First silicide formed by reaction of Ni(13%Pt) films with Si(100): Nature and kinetics by in-situ X-ray reflectivity and diffraction. Scripta Materialia, 2010, 63 (1), pp.24-27. ⟨10.1016/j.scriptamat.2010.02.040⟩. ⟨hal-01951270⟩
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